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Gas purifiers are used to deliver consistent reduction in molecular and solid contamination in process gases in the Metalorganic Chemical Vapor Deposition (MOCVD) process. Main contaminants include oxygen, water, and particulates, creating defects that result in reduced photoluminescence (Brightness) and color consistency. The product portfolio includes soltuions for purificaiton of high flow ammonia, hydrogen and XCDA (eXtreme clean dry air).
Other applicaitons include mobile phone displays, automotive sensors and lighting, next generation optical storage for High-Defintioin entertainment applications, LCD backlighting, architectural and residetntial illumination, laser diodes and sensors and traffic signals.
Purification systems for Ultra High Purity (UHP) Nitrogen, Hydrogen, and Hydride gases
Removal of gaseous contaminants down to part-per-trillion levels with inorganic media