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The Chemical Mechanical Planarization (CMP) step is known as one of the most precise and critical as it occurs in the latter stages of the manufacturing process - the point where the fab has the most time, effort and money invested in a wafer or substrate. For this reason, CMP tool and component designers are continually seeking ways to improve the performance of these processes.
Entegris has a line of CMP products to address many of the needs in the CMP fab areas: including, slurry filters, PVA brushes (post-CMP), pad conditioners and retaining rings. Each product is designed and built from Entegris' expertise in materials science and knowledge of our customers processing needs.
Molded-through-the-core PVA brushes for AMAT®, Ebara® and Ontrak® post-CMP equipment
Depth media filters for ceria, alumina and silica slurry
Injection molded retaining rings constructed of PEEK