Join Entegris at the International Conference for Planarization/CMP Technology (ICPT) as we present the following papers:
A Comprehensive Approach to CMP Process Optimization toward Defect Reduction and Yield Improvement
Authors: Ruben R.Lieten, Lucia D’Urzo, Don Frye, Bob Shi, Elizabeth Thomas, Volley Wang, Daniela White, Nancy Heyle, Herbert Struyf (Entegris, IMEC)
AC Impedance Analysis of Post CMP Cleaning Formulations
Authors: Volley Wang, Elizabeth Thomas, Jun Liu, Daniela White, Don Frye
Join Entegris at the International Conference for Planarization/CMP Technology (ICPT) as we present the following papers:
A Comprehensive Approach to CMP Process Optimization toward Defect Reduction and Yield Improvement
Authors: Ruben R.Lieten, Lucia D’Urzo, Don Frye, Bob Shi, Elizabeth Thomas, Volley Wang, Daniela White, Nancy Heyle, Herbert Struyf (Entegris, IMEC)
AC Impedance Analysis of Post CMP Cleaning Formulations
Authors: Volley Wang, Elizabeth Thomas, Jun Liu, Daniela White, Don Frye