Join us onsite for poster presentations:
April 27, 2022 | 5:30 – 7:30 PM PDT
- Examining strategies to control gel-like defects in EUV patterning materials
Authors: Shunji Kawato, Kozue Miura, Jinhwan Ahn, JongHoon Kim - Selective contaminant removal in EUV photoresists using a tailored functionality filter
Authors: Tetsu Kohyama, Jad Jaber - Removing metallic contaminants from solvents using advanced purifiers
Authors: Kusum Maharjan, Aiwen Wu, Ying Qi, James Hamzik
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Featured Content
Reliable patternmaking at such a fine scale requires ultraclean reticles. We can help you through your challenges of storing and transporting EUV reticles.
Flaws in photolithography patterns have always had a negative impact on yield. It is becoming more imperative than ever for semiconductor fabricators to prevent these pattern flaws to ensure the functionality and reliability of these devices.
This is a critical time for lithographers, as there will be even more filtration choices to consider as part of their toolkits. Collaboration between filter suppliers, photochemical suppliers, and lithographers is critical to understanding filtration performance and making smart choices early in the process.
As automotive electronics become more complex and prevalent, the cost of failure in these devices rises. Hidden defects caused by small particles, gels, metal ions, and organic contaminants can lead to failures throughout the vehicle’s life, escalating costs and increasing risk.
How can you prevent hidden defects?
To achieve optimum wafer yield and reliability, the microelectronics industry needs to address the increased materials consumption requirements and material purity challenges from chemical manufacture to point of use.